Cosmetics & Toiletries

Cosphaderm® Sodium LAAS is a white powder comprising the solid mixture of Sodium Levulinate and Sodium Anisate. This blend displays skin conditioning and masking properties, as well as a broad antimicrobial effectiveness. This way, Cosphaderm® Sodium LAAS can help to ensure a formulations microbiological stability without the use of traditional preservatives.

Cosphaderm® pAS natural is a plant-derived anisic acid with multifunctional properties. Due to its very gentle and pleasant scent, Cosphaderm pAS natural can be used as a masking agent to cover undesired odour from other ingredients. Another function of anisic acid is the strong antimicrobial efficacy at pH values below 6.0, especially against yeasts and molds.

Cosphaderm® Panthenol natural is the natural version of the well-established active ingredient D-Panthenol. Renowned for its versatile benefits, Panthenol is an indispensable addition to a wide range of formulations. This ingredient supports the skin’s natural barrier, helping to protect against external stressors while promoting hydration. Its calming and anti-inflammatory properties make it an excellent choice for addressing irritation, while its wound-care capabilities aid in skin recovery and repair. Its ability to strengthen skin, hair and nails make it an ideal all-rounder active for every formulation. Sourced sustainably, our Cosphaderm Panthenol natural delivers exceptional quality, aligning with growing demand for effective and eco-friendly cosmetic ingredients.

Cosphaderm® CHA is the Hydroxamic Acid of caprylic acid. The natural organic acid is a chelator and antimicrobial with a strong efficacy against a broad spectrum of microorganisms, especially yeasts and molds. In contrast to other organic acids, Cosphaderm® CHA remains undissociated even at neutral pH and is therefore applicable over a broad pH range up to pH 7.5. The combination of chelating and antimicrobial properties in one molecule allows for use of Cosphaderm CHA for stabilization of cosmetic formulations against metal ion-induced oxidation and protection against microorganisms at the same time.