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Notice for Indonesia Customers Only  View details
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Customer Support
Layanan Pengaduan Konsumen, PT DKSH Indonesia,

(Business Unit Performance Materials, Sales Support Team)

Address

Gedung AIA Central, Level 39, Jl. Jend. Sudirman Kav. 48A, Jakarta Selatan, Indonesia

+62 21 2988 8557

[email protected]

Direktorat Jenderal Perlindungan Konsumen dan Tertib Niaga Kementerian Perdagangan Republik Indonesia
0853 1111 1010

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CHEMARK® UV-5411

Chemark UV-5411 is a high molecular weight ultraviolet light absorber of the hydroxy phenyl benzotriazole class. Its inherent off-white color renders itself more suitable for application where light color is critical. Its low volatility and high lipophilicity makes it especially useful where additive losses may occur during high temperature process.
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CHEMARK® UV-589

Chemark UV-589 is a blending of UV absorber and antioxidant designed specifically for the protection of polymers especially for Epoxy resin from the damage of UV light and heating. Chemark UV-589 is more solvent soluble, has better resin compatibility, is less volatile, and provides a degree of stabilization that is significant better than other UV absorber based on benzotriazole or benzophenone which are commercially available in the market
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CHEMARK® 1374

Chemark 1374 belongs to a class of highly durable glycoluril family. It is used as a cross-linking agent in powder coatings for various indoor and outdoor applications. Due to its excellent weatherability, Chemark 1374 is especially useful for exterior surface applications such as lawn and garden equipments, furniture and building products. Chemark 1374 can be used to crosslink various kinds of polymers containing hydroxyl, amide and mercapto functionalities when heated in the presence of acid catalysts. The performance of Chemark 1374 is greatly addressed when used in powder coating formulations containing polyester or acrylic polymers. It provides the advantages of non-yellowing overbake, excellent light stability, superb solvent resistance and the ability of fast cure at low temperature.
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