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Notice for Indonesia Customers Only  View details
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Customer Support
Layanan Pengaduan Konsumen, PT DKSH Indonesia,

(Business Unit Performance Materials, Sales Support Team)

Address

Gedung AIA Central, Level 39, Jl. Jend. Sudirman Kav. 48A, Jakarta Selatan, Indonesia

+62 21 2988 8557

[email protected]

Direktorat Jenderal Perlindungan Konsumen dan Tertib Niaga Kementerian Perdagangan Republik Indonesia
0853 1111 1010

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RUVA-93

RUVA-93 by Otsuka Chemical is 2-Propenoic acid 2-methyl-, 2-[3-(2H-benzotriazol-2-yl)-4-hydroxyphenyl]ethyl ester. It is a reactive ultraviolet stabilizer. It is used in plastic lenses, film, sheets, packaging material, containers, fiber, and as alternative plastic to glass. It is a reactive ultraviolet absorber that is able to copolymerize efficiently with a variety of vinyl monomers such as methacrylic, styrenic, and acrylonitrile monomers. Provides permanent placement of the benzotriazole in the polymer. Imparts high weatherability to thin films and fibers. Provides permanence of the stabilizer in the resin and improved compatibility even in very high loadings. RUVA-93 offers excellent environmental acceptability, expanded technology options, and the ability to design new UV polymer screens with unique properties.

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Luna-stab LS-144

Luna-stab LS-144 is a hindered amine light stabiliser (HALS) that signifiantly coating life by minimising paint defects such as cracking and gloss reduction.

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Luna-nox 1076-J

Luna-nox 1076-J is a hindered phenol antioxidant, widely used in polymers including polypropylene, polyethylene, polystyrene, polyamide, ABS, and synthetic rubbers. It is also an effective antioxidant in oils and paints.

 

Luna-nox 1076-J is odourless, tasteless, low toxicity (LD50≥10000mg/kg) and light-stable, and is recommended for use at 0.1 – 0.3% dosage rate.

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VEENOX 1010 PW

Veenox 1010 PW is a sterically hindered phenolic antioxidant. It is a highly effective, non-discolouring stabilizer for organic substrates such as plastics, synthetic fibers, elastomers and adhesives. It protects these substrates against thermal and oxidative degradation.
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